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Wafer | A Wisdom Archive on Wafer |  | Wafer A selection of articles related to Wafer |  |
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 |  |  | Wafer: Encyclopedia II - Semiconductor fabrication - ProcessingFront End Processing refers to the most crucial steps in the fabrication. In this stage the actual devices, including transistors and resistors are created. A typical front end process includes the following: preparation of the wafer surface, growth of silicon dioxide (SiO2), patterning and subsequent implantation or diffusion of dopants to obtain the desired electrical properties, growth or deposition of a gate dielectric, and growth or deposition ...
See also:Semiconductor fabrication, Semiconductor fabrication - Wafers, Semiconductor fabrication - Processing, Semiconductor fabrication - Wafer test and device test, Semiconductor fabrication - List of steps, Semiconductor fabrication - Hazardous materials note, Semiconductor fabrication - History Read more here: » Semiconductor fabrication: Encyclopedia II - Semiconductor fabrication - Processing |
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 |  |  | Wafer: Encyclopedia II - Semiconductor fabrication - HistoryWhen feature widths were far greater than about 10 micrometres, purity was not the issue that it is today in device manufacture. But as the devices became more integrated the cleanrooms became even cleaner. Today, the facilities, known as fabs, are pressurized with filtered air, to remove even the smallest particles which could come to rest on the wafers and contribute to defects. The workers in a semiconductor fabrication facility are required to wear cleanroom s ...
See also:Semiconductor fabrication, Semiconductor fabrication - Wafers, Semiconductor fabrication - Processing, Semiconductor fabrication - Wafer test and device test, Semiconductor fabrication - List of steps, Semiconductor fabrication - Hazardous materials note, Semiconductor fabrication - History Read more here: » Semiconductor fabrication: Encyclopedia II - Semiconductor fabrication - History |
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 |  |  | Wafer: Encyclopedia II - Semiconductor fabrication - Processing(Karlleeser 07:12, 30 January 2006 (UTC))
In semiconductor device fabrication, the various processing steps fall into four general categories: deposition, removal, patterning, and modification of electrical properties.
Deposition is any process that grows, coats, or otherwise transfers a material onto the wafer. Available technologies consist of physical vapor deposition (PVD), chemical vapor deposition (CVD), electrochemical deposition (ECD), molecular beam epitaxy (MBE) and more recently, atomic layer deposition (ALD) a ...
See also:Semiconductor fabrication, Semiconductor fabrication - Wafers, Semiconductor fabrication - Processing, Semiconductor fabrication - Wafer Test, Semiconductor fabrication - Device Test, Semiconductor fabrication - List of Steps, Semiconductor fabrication - Hazardous materials note, Semiconductor fabrication - History Read more here: » Semiconductor fabrication: Encyclopedia II - Semiconductor fabrication - Processing |
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 |  |  | Wafer: Encyclopedia II - Semiconductor fabrication - HistoryWhen feature widths were far greater than about 10 micrometres, purity was not the issue that it is today in device manufacture. But as the devices became more integrated the cleanrooms became even cleaner. Today, the facilities, known as fabs, are pressurized with filtered air, to remove even the smallest particles which could come to rest on the wafers and contribute to defects. The workers in a semiconductor fabrication facility are required to wear cleanroom s ...
See also:Semiconductor fabrication, Semiconductor fabrication - Wafers, Semiconductor fabrication - Processing, Semiconductor fabrication - Wafer Test, Semiconductor fabrication - Device Test, Semiconductor fabrication - List of Steps, Semiconductor fabrication - Hazardous materials note, Semiconductor fabrication - History Read more here: » Semiconductor fabrication: Encyclopedia II - Semiconductor fabrication - History |
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 |  |  | Wafer: Encyclopedia II - Semiconductor fabrication - Hazardous materials noteMany toxic materials are used in the fabrication process. These include:
poisonous elemental dopants such as arsenic, boron, antimony and phosphorus
poisonous compounds like arsine, phosphine and silane
highly reactive liquids, such as hydrogen peroxide, fuming nitric acid, sulfuric acid and hydrofluoric acid
It is vital that workers are not directly exposed to these dangerous substances. The high degree of automation common in the IC fa ...
See also:Semiconductor fabrication, Semiconductor fabrication - Wafers, Semiconductor fabrication - Processing, Semiconductor fabrication - Wafer test and device test, Semiconductor fabrication - List of steps, Semiconductor fabrication - Hazardous materials note, Semiconductor fabrication - History Read more here: » Semiconductor fabrication: Encyclopedia II - Semiconductor fabrication - Hazardous materials note |
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 |  |  | Wafer: Encyclopedia II - Semiconductor fabrication - Hazardous materials noteMany toxic materials are used in the fabrication process. These include:
poisonous elemental dopants such as arsenic, boron, antimony and phosphorus
poisonous compounds like arsine, phosphine and silane
highly reactive liquids, such as hydrogen peroxide, fuming nitric acid, sulfuric acid and hydrofluoric acid
It is vital that workers not be directly exposed to these dangerous substances. The high degree of automation common in the IC fa ...
See also:Semiconductor fabrication, Semiconductor fabrication - Wafers, Semiconductor fabrication - Processing, Semiconductor fabrication - Wafer Test, Semiconductor fabrication - Device Test, Semiconductor fabrication - List of Steps, Semiconductor fabrication - Hazardous materials note, Semiconductor fabrication - History Read more here: » Semiconductor fabrication: Encyclopedia II - Semiconductor fabrication - Hazardous materials note |
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