 |
|
|
photolithography | A Wisdom Archive on photolithography | | photolithography A selection of articles related to photolithography | |
| | photolithography | | | Page 1 » Page 2 « Page 3 More » | |
| |
| ARTICLES RELATED TO photolithography | | | |  photolithography: Encyclopedia II - Ultraviolet - UsesUV light has many various uses.
Ultraviolet - Black lights.
A black light is the name commonly given to a lamp emitting almost entirely long wave UV radiation and very little visible light. Fluorescent black lights are typically made in the same fashion as normal fluorescent lights except that only one phosphor is used instead of the typical 2 or 3 which produce a full spectrum light and the normally clear glass envelope of the bulb is replaced by a deep bluish purple glass called Wood's glass. Wood's glas ...
See also:Ultraviolet, Ultraviolet - Discovery, Ultraviolet - Health concerns and protection, Ultraviolet - Skin, Ultraviolet - Eye, Ultraviolet - Immune system, Ultraviolet - Beneficial effects, Ultraviolet - Uses, Ultraviolet - Black lights, Ultraviolet - Fluorescent lamps, Ultraviolet - Pest control, Ultraviolet - Spectrophotometry, Ultraviolet - Astronomy, Ultraviolet - Analyzing minerals, Ultraviolet - Photolithography, Ultraviolet - Checking electrical insulation, Ultraviolet - Sterilization, Ultraviolet - Disinfecting drinking water, Ultraviolet - Food Processing, Ultraviolet - Fire detection, Ultraviolet - Curing of adhesives and coatings, Ultraviolet - Deterring Substance Abuse in Public Restrooms, Ultraviolet - External link Read more here: » Ultraviolet: Encyclopedia II - Ultraviolet - Uses |
| |
| | | | | photolithography: Encyclopedia II - Moore's law - Future trends As of Q1 2006, current PC processors are fabricated at the 90 nm and 65 nm chips are just being rolled out by Intel (Presler & Intel Core). A decade ago, chips were built at a 500 nm level. Companies are working on using nanotechnology to solve the complex engineering problems involved in producing chips at the 45 nm, 30 nm, and even smaller levels—a process that will postpone the industry meeting the limits of Moore's Law.
Recent computer industry technology "roadmaps" predict (as of 2001) that Moore's Law will continue fo ...
See also:Moore's law, Moore's law - Earliest forms, Moore's law - Formulations of Moore's law, Moore's law - An industry driver, Moore's law - Future trends, Moore's law - Other considerations, Moore's law - Notes Read more here: » Moore's law: Encyclopedia II - Moore's law - Future trends |
| |
| | | | | photolithography: Encyclopedia II - Phenol formaldehyde resin - Base catalysed Base catalysed phenol formaldehyde resins are made with a formaldehyde to phenol ratio of greater than one (usually around 1.5). Phenol, formaldehyde, water and catalyst are mixed in the desired amount, depending on the resin to be formed, and are then heated. The first part of the reaction, at around 70 °C, forms hydroxymethyl phenols. This results in a thick reddish-brown goo, the resin.
The rate of the base catalysed reaction initially increases with pH, and reaches a maximum at approx. pH = 10. The reactive species is the phenoli ...
See also:Phenol formaldehyde resin, Phenol formaldehyde resin - Acid catalysed, Phenol formaldehyde resin - Base catalysed, Phenol formaldehyde resin - Crosslinking and the phenol/formaldehyde ratio Read more here: » Phenol formaldehyde resin: Encyclopedia II - Phenol formaldehyde resin - Base catalysed |
| |
| | | | | photolithography: Encyclopedia II - Depth of field - Definition of focus Several factors determine whether the objective error in focus becomes noticeable. Subject matter, movement, the distance of the subject from the camera, and the way in which the image is displayed all have an influence. However, the most important factor is the actual degree of error in relation to the area of film exposed.
Light from a point source at the correct distance will produce the image of a point on the film. A point farther away or nearer will produce the image of a disk whose border is known as "circle of confusion." The diameter of these circles increases with distance from the point of focus and so can be ...
See also:Depth of field, Depth of field - Definition of focus, Depth of field - Hyperfocal distance, Depth of field - Depth of field formula, Depth of field - Artistic considerations, Depth of field - Aperture effects, Depth of field - Depth of field versus film format size, Depth of field - Depth of field in photolithography, Depth of field - In ophthalmology and optometry Read more here: » Depth of field: Encyclopedia II - Depth of field - Definition of focus |
| |
| | | | | photolithography: Encyclopedia II - Integrated circuit - History, origins and generations
Integrated circuit - The birth of the IC.
The integrated circuit was first conceived by a radar scientist, Geoffrey W.A. Dummer (born 1909), working for the Royal Radar Establishment of the British Ministry of Defence, and published in Washington, D.C. on May 7, 1952. Dummer unsuccessfully attempted to build such a circuit in 1956.
The first integrated circuits were manufactured independently by two scientists: Jack Kilby of Texas Instruments filed a patent for a "Solid Circuit" made of germanium on Februa ...
See also:Integrated circuit, Integrated circuit - Introduction, Integrated circuit - Advances in integrated circuits, Integrated circuit - Popularity of ICs, Integrated circuit - Classification and complexity, Integrated circuit - Manufacture, Integrated circuit - Fabrication, Integrated circuit - Packaging, Integrated circuit - History, origins and generations, Integrated circuit - The birth of the IC, Integrated circuit - SSI, MSI, LSI, Integrated circuit - VLSI, Integrated circuit - ULSI, WSI, SOC, Integrated circuit - Other developments, Integrated circuit - Key industrial and academic data, Integrated circuit - Notable ICs, Integrated circuit - Manufacturers, Integrated circuit - VLSI conferences, Integrated circuit - VLSI journals Read more here: » Integrated circuit: Encyclopedia II - Integrated circuit - History, origins and generations |
| |
| | | | | | | | | | | photolithography: Encyclopedia II - Integrated circuit design - Coping with variability in analog design A challenge most critical to analog IC design involves the variability of the individual devices built on the semiconductor chip. Unlike board-level circuit design which permits the designer to select devices that have each been tested and binned according to value, the device values on an IC can vary widely which are uncontrollable by the designer. For example, some IC resistors can vary ±20% and β of an integrated BJT can vary from 20 to 100. To add to the design challenge, device properties often vary between each processed semiconducto ...
See also:Integrated circuit design, Integrated circuit design - Physics of IC design, Integrated circuit design - Analog and Digital Design, Integrated circuit design - Digital IC design, Integrated circuit design - RTL design, Integrated circuit design - Physical design, Integrated circuit design - Analog IC design tools, Integrated circuit design - Coping with variability in analog design, Integrated circuit design - Tools and Vendors, Integrated circuit design - Design steps Read more here: » Integrated circuit design: Encyclopedia II - Integrated circuit design - Coping with variability in analog design |
| |
| | | | | photolithography: Encyclopedia II - Lithography - Lithography as an artistic medium During the first twenty-five years of the nineteenth century, the practice of lithography was predominantly restricted to cheap reproductions of paintings and drawings. However, around 1825 the French artists Ingres, Géricault, and Delacroix embraced the process as a way to avoid the problems inherent in wood-block and copper engraving, namely, the near necessity of middlemen like draughtsmen (who transferred the image to the wood or copper plate) and engravers (who carved the image out of the plate). The advantage to lithography (for an ar ...
See also:Lithography, Lithography - Printing, Lithography - The principle, Lithography - The chemical process, Lithography - The early process, Lithography - The modern process, Lithography - Semiconductor lithography, Lithography - Lithography as an artistic medium Read more here: » Lithography: Encyclopedia II - Lithography - Lithography as an artistic medium |
| |
| | | | | photolithography: Encyclopedia II - Inkjet printer - Professional inkjet printers Besides the well known small inkjet printers for home and office, there is a market for professional inkjet printers; most of them being for wide format printing. "Wide format" means that there are printers ranging in print width from 24" inch up to 5 meters. The application of most of these printers is for printing advertising graphics; a minor application is printing of designs by architects or engineers.
In terms of units, the major supplier is Hewlett-Packard. They own over 90% of the market for printers for printing techni ...
See also:Inkjet printer, Inkjet printer - In general, Inkjet printer - Technology, Inkjet printer - Thermal Ink Jet, Inkjet printer - Piezoelectric Ink Jet, Inkjet printer - Continuous Ink Jet, Inkjet printer - Inkjet Inks, Inkjet printer - Inkjet head design, Inkjet printer - Advantages, Inkjet printer - Disadvantages, Inkjet printer - Underlying business model, Inkjet printer - Professional inkjet printers, Inkjet printer - Inkjet Printing of Functional Materials Read more here: » Inkjet printer: Encyclopedia II - Inkjet printer - Professional inkjet printers |
| |
| | | | | photolithography: Encyclopedia II - Depth of field - Aperture effects The aperture controls the effective diameter of the lens opening. Reducing the aperture size increases the depth of field; however, it also reduces the amount of light transmitted, placing a practical limit on the extent to which the aperture size may be reduced. Photography lenses almost invariably work best at medium apertures. Motion pictures make only limited use of this control. To produce a consistent image quality from shot to shot, cinematographers usually choose a single aperture setting for interiors and another for exteriors and a ...
See also:Depth of field, Depth of field - Definition of focus, Depth of field - Hyperfocal distance, Depth of field - Depth of field formula, Depth of field - Artistic considerations, Depth of field - Aperture effects, Depth of field - Depth of field versus film format size, Depth of field - Depth of field in photolithography, Depth of field - In ophthalmology and optometry Read more here: » Depth of field: Encyclopedia II - Depth of field - Aperture effects |
| |
| | | | | photolithography: Encyclopedia II - Depth of field - Depth of field versus film format size As the equations above show, depth of field also related to the circle of confusion which is a figure of merit associated with each type of film format. Larger imaging devices (such as 8x10 inch photographic plates) have a larger circle of confusion, while smaller imaging devices such as point-and-shoot digital cameras have a smaller circle of confusion. All else being equal, depth of field is inversely proportional to the film format size.
In practical terms this means that smaller cameras have deeper depth of field than larger camer ...
See also:Depth of field, Depth of field - Definition of focus, Depth of field - Hyperfocal distance, Depth of field - Depth of field formula, Depth of field - Artistic considerations, Depth of field - Aperture effects, Depth of field - Depth of field versus film format size, Depth of field - Depth of field in photolithography, Depth of field - In ophthalmology and optometry Read more here: » Depth of field: Encyclopedia II - Depth of field - Depth of field versus film format size |
| |
| | | | | photolithography: Encyclopedia II - Doping semiconductor - Compensation In most cases, many types of impurity will be present. If an equal number of donors and acceptors are present in the semiconductor, the extra electrons provided by the former will be used to satisfy the broken bonds due to the latter, so that doping produces no free carriers of either type. This phenomenon is known as compensation, and occurs at the p-n junction in the vast majority of semiconductor devices. Partial compensation, where donors outnumber acceptors or vice-versa, allows device makers to repeatedly reverse the type of a given portion of the mater ...
See also:Doping semiconductor, Doping semiconductor - Dopant elements, Doping semiconductor - Group IV semiconductors, Doping semiconductor - III-V and II-VI semiconductors, Doping semiconductor - Compensation, Doping semiconductor - Doping in organic conductors Read more here: » Doping semiconductor: Encyclopedia II - Doping semiconductor - Compensation |
| |
| | | | | photolithography: Encyclopedia II - Fanzine - Origin The origins of "fanzines" are obscure, but can be traced at least back to 19th-century literary groups in the United States which formed amateur press associations to publish collections of amateur fiction, poetry and commentary. These publications were produced first on small tabletop printing presses, often by students.
As professional printing technology progressed, so did the technology of fanzines. Early fanzines were hand-drafted or typed on a manual typewriter and printed using primitive reproduction techniques (e.g., the spiri ...
See also:Fanzine, Fanzine - Origin, Fanzine - Genres, Fanzine - Science fiction fanzines, Fanzine - Comics and Graphic Arts fanzines, Fanzine - Rock fanzines, Fanzine - Punk fanzines, Fanzine - Role-playing fanzines, Fanzine - Sport, Fanzine - Recent developments Read more here: » Fanzine: Encyclopedia II - Fanzine - Origin |
| |
| | | | | photolithography: Encyclopedia II - Depth of field - Depth of field formula Let H be the hyperfocal distance (calculated below from N = aperture number, and c, the circle of confusion for a given film format), let s be the distance at which the camera is focused, let f be the focal length, let DF be the distance from the camera to the far limit of depth of field, and let DN be the distance from the camera to the near limit of depth of field. Then depth of field (DOF) is gi ...
See also:Depth of field, Depth of field - Definition of focus, Depth of field - Hyperfocal distance, Depth of field - Depth of field formula, Depth of field - Artistic considerations, Depth of field - Aperture effects, Depth of field - Depth of field versus film format size, Depth of field - Depth of field in photolithography, Depth of field - In ophthalmology and optometry Read more here: » Depth of field: Encyclopedia II - Depth of field - Depth of field formula |
| |
| | | | | photolithography: Encyclopedia II - Integrated circuit - Key industrial and academic data
Integrated circuit - Notable ICs.
The 555 common multivibrator subcircuit (common in electronic timing circuits)
The 741 operational amplifier
7400 series TTL logic building blocks
4000 series, the CMOS counterpart to the 7400 series
Intel 4004, the world's first microprocessor
The MOS Technology 6502 and Zilog Z80 microprocessors, used in many home computers< ...
See also:Integrated circuit, Integrated circuit - Introduction, Integrated circuit - Advances in integrated circuits, Integrated circuit - Popularity of ICs, Integrated circuit - Classification and complexity, Integrated circuit - Manufacture, Integrated circuit - Fabrication, Integrated circuit - Packaging, Integrated circuit - History origins and generations, Integrated circuit - The birth of the IC, Integrated circuit - SSI MSI LSI, Integrated circuit - VLSI, Integrated circuit - ULSI WSI SOC, Integrated circuit - Other developments, Integrated circuit - Key industrial and academic data, Integrated circuit - Notable ICs, Integrated circuit - Manufacturers, Integrated circuit - VLSI conferences, Integrated circuit - VLSI journals Read more here: » Integrated circuit: Encyclopedia II - Integrated circuit - Key industrial and academic data |
| |
| | | | | photolithography: Encyclopedia II - Integrated circuit - Advances in integrated circuits Among the most advanced integrated circuits are the microprocessors, which control everything from computers to cellular phones to digital microwave ovens. Digital memory chips are another family of integrated circuit that is crucially important to the modern information society. While cost of designing and developing a complex integrated circuit is quite high, when spread across typically millions of production units the individual IC cost is minimized. The performance of ICs is high because the small size allows short traces which in turn allo ...
See also:Integrated circuit, Integrated circuit - Introduction, Integrated circuit - Advances in integrated circuits, Integrated circuit - Popularity of ICs, Integrated circuit - Classification and complexity, Integrated circuit - Manufacture, Integrated circuit - Fabrication, Integrated circuit - Packaging, Integrated circuit - History origins and generations, Integrated circuit - The birth of the IC, Integrated circuit - SSI MSI LSI, Integrated circuit - VLSI, Integrated circuit - ULSI WSI SOC, Integrated circuit - Other developments, Integrated circuit - Key industrial and academic data, Integrated circuit - Notable ICs, Integrated circuit - Manufacturers, Integrated circuit - VLSI conferences, Integrated circuit - VLSI journals Read more here: » Integrated circuit: Encyclopedia II - Integrated circuit - Advances in integrated circuits |
| |
| | | Page 1 » Page 2 « Page 3 More » | |
| |
|
|
